• Keine Ergebnisse gefunden

The importance of ions and flux in pulsed laser deposition

N/A
N/A
Info
Herunterladen
Protected

Academic year: 2022

Aktie "The importance of ions and flux in pulsed laser deposition"

Copied!
1
0
0

Wird geladen.... (Jetzt Volltext ansehen)

Jetzt herunterladen ( 1 Seite )

Volltext

(1)

Group  Seminar:  29.October  2010,  9:30  am,  OFLG  401  

The importance of ions and flux in pulsed laser deposition

Carmen N. Afonso

Laser Processing Group, Instituto de Optica, CSIC, Madrid, Spain http://www.io.csic.es/Web_GPL/index.html

Pulsed laser deposition is acknowledged as a process that involves ions with kinetic energies that can be much higher than 200 eV and large flux of species arriving to the substrate. They lead to higher nucleation rates than when using more conventional deposition techniques and processes at the substrate such as sputtering of deposited material or sub-surface implantation with have impact on the film quality. Several examples of ablation of metals or alternate ablation of metals and oxide, will be given to illustrate these processes, correlating both plasma and film properties.

 

Referenzen

Jetzt herunterladen ( PDF - 1 Seite - 47.14 KB )

ÄHNLICHE DOKUMENTE

Preferential Deposition of Snow and Dust Over Hills: Governing Processes and Relevant Scales

The snow height profiles (Figure 9) indicate that, for the largest values of Fr (simulation S1), the deposition pattern is characterized by a relatively small local maximum on

Modeling of Atmospheric Transport and Deposition of Heavy Metals in the Katowice Province

The deposition results fro111 the MESOILPDD modeling applied t o the mesoscale domain were supplemented by contributions from other emission sources in Europe

Deposition of nanoparticle metal films using nanosecond and femtosecond lasers

We have studied the dynamics of both the plasma and nanoparticle ablation plumes using Langmuir probe, optical emission spectroscopy and time- resolved optical absorption.. In ns

Room-Temperature Deposition of DLC Films by an Ion Beam Method, Reactive Magnetron Sputtering and Pulsed Laser Deposition: Process Design, Film Structure and Film Properties

In general, ion beam sources accelerate carbon ions electrostatically via a bias voltage through a grid towards the substrate. The ions can be either produced by a sputtering plasma

MARGUS KODU Pulsed Laser Deposition of Magnesium Oxide and Barium Ternary Oxides for Plasma Display

The deposition conditions of the MgO films were as follows: laser wavelength 248 nm, the laser pulse energy density on the target 7 or 10 J/cm 2 , the repetition rate of laser 10

Quiet nucleation of atmospheric aerosol and intermediate ions Quiet nucleation of atmospheric aerosol and intermediate ions

 growth rate at a certain size and a value of n for neutral particles,  growth rates at two different sizes,.  ratio of growth rates at two different sizes and a

An overview of surface‑enhanced Raman scattering substrates by pulsed laser deposition technique: fundamentals and applications

enhanced Raman spectroscopy (SERS) using Ag nanoparti- cle films produced by pulsed laser deposition.. Fan M, Andrade GFS, Brolo AG (2011) A review on the fabri- cation of

Conditions and processes leading to large-scale gold deposition in the Jiaodong province, eastern China

Based on the model construction of quartz solubility and the forward calculation of phase behavior of H 2 O-NaCl-CO 2 fluid system under different PVTx conditions, this paper