Variable (Usual)
Dimension Meaning
AARC Absorption in the anti reflectance coating
Ai m2 Area of the region with emitter sheet resistance Rsheet,i
Amax m2 Not-metalized solar cell area
Ashaded m2 Area, which is additionally shaded
Atotal m2 Area of the whole solar cell or symmetry element
B cm3s-1 Coefficient of radiative recombination Cloc
Calibration factor needed for voltage calibration of PL-measurements
Cn m6/s Auger coefficient of the eeh process Cp m6/s Auger coefficient of the ehh process
df m Distance of two adjacent fingers on the front of a solar cell
Dit cm-2 Surface or interface state density
dn m Depth of one node in direction parallel to the fingers in a distributed circuit model
Dn cm2s-1 Diffusion coefficient of the electrons Dp cm2s-1 Diffusion coefficient of the holes
E V/m Electrical field
EC eV Lowest energy in the conduction band
EF eV Fermi level
Eg eV Energy of the band gap
Ei eV Energy of the fermi level in an intrinsic semiconductor at thermal equilibrium
Ek eV Energy of an electron with momentum k
Et eV Energy of a defect level
Etop eV Highest energy in the conduction band
Variable (Usual)
Dimension Meaning
EV eV Highest energy in the valence band
F(E) Fermi-Dirac distribution
fE Emitter correction factor to correct the effect of the emitter sheet resistance in a distributed circuit model fF
Correction factor to correct the effect of the resistance of the metal fingers in a distributed circuit model
G m-3s-1 Generation rate
Gill m-3s-1 Generation rate due to illumination Gn m-3s-1 Generation rate of electrons
Current, which passes the emitter resistance Rl* in between two adjacent fingers in a distributed circuit model of a solar cell
Iwith shading W/cm2
Illumination intensity used to generate the one sun short circuit current density in case of an additionally shaded area
Iwithout shading W/cm2
Illumination intensity used to generate the one sun short circuit current density without additionally shaded region (0.1 W/cm2)
J0 A/cm2 Generation current density (one diode model) J01 A/cm2 Generation current density in the neutral regions
(two diode model)
J02 A/cm2 Generation current density of the space charge region (two diode model)
Jill A/cm2 Additionally generated current density due to illumination
( )
VJlocalxsuns A/cm2 Local IV characteristic of a solar cell illuminated with an illumination intensity of x suns
Variable (Usual)
Dimension Meaning
Jmpp A/cm2 Current density at maximum power point Jn A/cm2 Current density of the electrons
Jp A/cm2 Current density of the holes Jsc A/cm2 Short circuit current density
xsuns local
Jsc, A/cm2 Local short circuit current density using an illumination intensity of x suns
sun
Jsc1 A/cm2 One sun short circuit current density
k kg m s-1 Momentum of an electron
kB Boltzmann constant, 1.380 6504×10-23 J/K [117]
lf cm Length of one finger on a solar cell
Ln cm Diffusion length of the electrons
Lh cm Diffusion length of the holes
m Ideality factor used in the one diode model
M
Part of the area of the solar cell, which is illuminated by the measurement spot and which is covered by the front metallization
MC Number of equivalent minima in the conduction band
mde kg Density-of-state effective mass for electrons mdh kg Density-of-state effective mass for holes
mhh* kg Effective mass of the heavy holes in the valence band mi* kg Effective mass of the electrons along the principal
axes of the ellipsoidal energy surfaces
mlh* kg Effective mass of the light holes in the valence band
mloc Local ideality factor
n cm-3 Electron density in the conduction band
Ν(Ε) cm-3 Density of states
n0 cm-3 Electron concentration in the conduction band at thermal equilibrium
n1 cm-3 SRH density for electrons
Variable (Usual)
Dimension Meaning
n1 Ideality factor of the first diode in the two diode model
n2 Ideality factor of the second diode in the two diode model
NA cm-3 Total concentration of acceptors
−
NA cm-3 Concentration of ionized acceptors
0
NA cm-3 Concentration of unionized acceptors Nb,Y
Number of nodes beneath the bus bar in direction parallel to the fingers in a distributed circuit model of a solar cell
Nbf,X
Number of nodes between two adjacent fingers in direction perpendicular to them in a distributed circuit model of a solar cell
NC cm-3 Effective density of states in the conduction band
ND cm-3 Total concentration of donors
+
ND cm-3 Concentration of ionized donors
0
ND cm-3 Concentration of unionized donors
Nf,X
Number of nodes beneath one grid finger in direction perpendicular to it in a distributed circuit model of a solar cell
Nf,Y
Number of nodes in the area of the grid fingers in direction parallel to them in a distributed circuit model of a solar cell
Nfront cm-3 Front surface doping concentration of an emitter
profile
ni cm-3 Intrinsic carrier concentration at thermal equilibrium nn cm-3 Electron concentration at the edge of the space charge
region in the n-doped material
np cm-3 Electron concentration at the edge of the space charge region in the p-doped material
nS cm-3 Concentration of electrons at the surface
Variable (Usual)
Dimension Meaning
Nt cm-3 Defect concentration
NV cm-3 Effective density of states in the valence band
p cm-3 Hole density in the valence band
p0 cm-3 Hole concentration in the valance band at thermal equilibrium
p1 cm-3 SRH density for holes
Pin W/cm2 Power density of an external illumination
corr suns
PLIVoc,0.2
PL-image obtained under Voc conditions and 0.2 suns equivalent illumination intensity, which is corrected for lifetime effects
corr onesun
PLIVext,
PL-image obtained applying an external voltage Vext and one sun equivalent illumination intensity, which is corrected for lifetime effects
PLIJsc,0.2suns
PL-image taken at Jsc-conditions and 0.2 suns equivalent illumination intensity
PLIJsc,onesun
PL-image taken at Jsc-conditions and one sun equivalent illumination intensity
PLIVoc,0.2suns
PL-image taken at Voc-conditions and 0.2 suns equivalent illumination intensity
PLIVext,onesun
PL-image taken at externally applied voltage Vext- and one sun equivalent illumination intensity
Ploss W Power loss in a solar cell due to (emitter) resistances pn cm-3 Hole concentration at the edge of the transition region
in the n-doped material
pp cm-3 Hole concentration at the edge of the transition region in the p-doped material
ps cm-3 Concentration of holes at the surface
q Elementary charge, 1.602 176 462(63)×10-19 C [117]
R s-1 cm-3 Total recombination rate
R0 s-1 cm-3 Recombination rate at thermal equilibrium RARC Reflectance of the anti reflectance coating