The Mu3e Experiment Introduction and Current Status
Moritz Kiehn for the Mu3e Collaboration
Physikalisches Institut, Universität Heidelberg
NuFACT2014, Glasgow, 25. August 2014
The Mu3e Experiment 2
• Precision experiment
• Search forµ+→e+e−e+
• Sensitivity<1 in 1016 decays In this talk
• Experimental Concept
• Current Status
• Pixel Sensor Prototypes
µ → eee in the Standard Model 3
Features
• Charged lepton flavor violating
• Via neutrino mixing
• Expected BR(µ→eee)≪10−50
• Current Limit from Sindrum
BR(µ→eee)<1·10−12 @90 % CL
Nucl.Phys. B299(1)
Importance
• Observable rate only from New Physics
• Sensitive New Physics Search
Muon Beamlines at PSI 4
Paul Scherrer Institute
• Villigen, Switzerland
• Currently hosts the MEG Experiment Muon Beamlines
• Low energy DC beams
• Current beam lines:
≈1·108µ/s(πE5)
• Future high intensity beam:
>1·109µ/s
2x109 µ/s
50 ns integration
Signal and Backgrounds 6
Signal
e+
e+ e-
Backgrounds Internal Conversion
e- e+
e+ ν
ν
Combinatorial
e+
e+ e-
• Common vertex
•
P~pi =0
• p <53 MeV
• Common vertex
•
Pp~i 6=0
• In-time
• No common vertex
• Out-of-time Requires σp<0.5 MeV
σt <1 ns
Multiple Scattering 7
Ω MS
θ
MSB
θ
MS∼
1pp x / X
0Example
• p =35 MeV
• 200 µm Si
• ΩR =5 cm
• ∆y ≈1 mm
→ Low material budget
Detector Concept 8
Target μ Beam
Environment
• >109 µ+ Decays/s
• Electrons p<53 MeV
• Multiple scattering dominates
Detector Concept 8
Target Inner pixel layers μ Beam
Environment
• >109 µ+ Decays/s
• Electrons p<53 MeV
• Multiple scattering dominates
Detector Concept 8
Target Inner pixel layers
Scintillating fibres
Outer pixel layers μ Beam
Environment
• >109 µ+ Decays/s
• Electrons p<53 MeV
• Multiple scattering dominates
Detector Concept 8
Target Inner pixel layers
Scintillating fibres
Outer pixel layers Recurl pixel layers
Scintillator tiles
μ Beam
Environment
• >109 µ+ Decays/s
• Electrons p<53 MeV
• Multiple scattering dominates
Full Detector 9
Magnetic field∼1 T Continuous readout
Tracker Requirements
• Fast serial readout ∼20 MHz
• Thin<1 ‰X0
• 80 µm×80 µm pixel
• 1 cm×2 cm sensor area
Timing
• Resolution<1 ns
Ultra-Lightweight Mechanics 10
• 50 µm Silicon sensor
• 25 µm Kapton flexprint
• 25 µm Kapton support frame
→ ∼1 ‰Radiation length
Scintillating Fibres 12
Fibre and SiPM Array
Signal Spectrum
Efficiency > 98%
(2 photons or more)
Single Photon
• 3-5 layers of fibres
• Readout with SiPM and custom ASIC (StiC)
• Time resolution
∼1 ns (22Na-source)
Scintillating Tiles 13
Tile Station
Tile Prototype
3.5 cm
Time Resolution
Time Difference [ps]
-7500 -500 -250 0 250 500 750
2000 4000 6000 8000 10000
σ = 79.2 ps
• ∼0.5 cm3 per tile
• Readout with SiPM and custom ASIC (StiC)
• Time resolution
∼80 ps(testbeam)
Monolithic Active Pixel Sensors 14
I. Peric, P. Fischer et al. NIMA 582(2007)876
• HV∼70 V (HV-MAPS)
• Fast charge collection by drift
• Thin active zone<20 µm
• Cheap, commercial process
HV-MAPS Prototypes 15
Design Specifications
• 80 µm×80 µm pixel size
• 1 cm×2 cm active area MuPix2
• 39 µm×30 µm pixel size
• 1.8 mm×1 mm active area
• Proof of Concept MuPix3/4
• 92 µm×80 µm pixel size
• 2.9 mm×3.2 mm active area
MuPix4 HV-MAPS Prototype 16
32 Columns / 2.944 mm
40 Rows / 3.2 mm • 92 µm×80 µm pixel size
• Global threshold
• Zero-suppressed digital readout
• Timestamps
• Additional readout FPGA
Single Hit Resolution 19
1.5 1.0 0.5 0.0 0.5 1.0 1.5
Column Residuals
1.5 1.0 0.5 0.0 0.5 1.0 1.5
Row Residuals
Pixel 92 µm
80 µm
0 500
Rate / a.u.
0 200
Rate / a.u.
612 1824 3036 4248 54
Rate / a.u.
0° incidence angle 70 V high voltage 823 mV threshold
Global Efficiency 20
820 830 840 850 860 870 880
Global Threshold / mV
0.88 0.90 0.92 0.94 0.96 0.98 1.00
Efficiency
HV = 70V E = 5GeV
0.0° incidence angle 22.5° incidence angle 45.0° incidence angle
Effective thickness∼1/cosα
Pixel Efficiency 21
0 5 10 15 20 25 30
Column Number
0 5 10 15 20 25 30 35
Row Number
0.980.99 1.00
Efficiency
0.98 1.00
Efficiency
0.00.10.2 0.30.4 0.50.6 0.70.8 0.91.0
Efficiency
0° incidence angle 70 V high voltage 823 mV threshold
Subpixel Efficiency / 4x4 Pixels 22
0 1 2 3
Column Number
0 1 2 3
Row Number
0.980.99 1.00
Efficiency
0.98 1.00
Efficiency
0.00.10.2 0.30.4 0.50.6 0.70.8 0.91.0
Efficiency
0° incidence angle 70 V high voltage 823 mV threshold
Timing 23
-400 -200 0 400
500 1000 1500 2000 2500 3000
200
Difference between trigger and timestamp [ns]
σ = 16.6 ns
Hits per 10 ns bin
Timestamp frequency 100 MHz
• Sensor + DAQ
• Resolution 17 ns
Future MuPix Prototypes 24
MuPix6
• Currently in the lab
• Updated analog part, e.g.
2-stage amplifier
• Same geometry MuPix7
• Just submitted
• Fast serial readout
• Full digital logic
• Still small scale prototype
Cooling with Helium 25
Why Helium?
• Low density, low scattering
• High mobility Temperature Gradient
3.5 m/s in air
Reconstruction 26
Reconstruction Efficiency
• >90 % efficiency for 4-hit tracks
• Dropoff is detector acceptance
Momentum Resolution
3-hit track, σ ≈1.5 MeV
6-hit track, σ≈0.2 MeV
• Full GEANT4 simulation
• Custom reconstruction
• Noenergy loss correction
Expected Sensitivity 27
Phase IA: earliest 2016
• 2·107µ/s
• Central pixel layers Phase IB: 2017+
• 1·108µ/s + Timing
+ 1st recurl stations Phase II: 2019+
• 2·109µ/s
• Full detector
• Future Muon Beamline
Expected Sensitivity 27
Phase IA: earliest 2016
• 2·107µ/s
• Central pixel layers Phase IB: 2017+
• 1·108µ/s + Timing
+ 1st recurl stations Phase II: 2019+
• 2·109µ/s
• Full detector
• Future Muon Beamline
Expected Sensitivity 27
Phase IA: earliest 2016
• 2·107µ/s
• Central pixel layers Phase IB: 2017+
• 1·108µ/s + Timing
+ 1st recurl stations Phase II: 2019+
• 2·109µ/s
• Full detector
• Future Muon Beamline
The Mu3e Collaboration 28
Paul Scherrer Institute University Geneva ETH Zürich University Zürich Heidelberg University
Karlsruhe Institute of Technology Mainz University
Summary and Outlook 29
Mu3e
• Search forµ+→e+e−e+
• Sensitivity<1 in 1016 decays Features
• HV-MAPS silicon sensors
• Ultra-thindetector
• Down to100 pstiming
• Up to2·109µ/s
In the Future
• First data in 2016+
• Full rate not before 2019
http://www.psi.ch/mu3e
Backup
Silicon Pixel Sensors A1
Hybrid
Sensor 250 μm Readou
t chip 180 μm
Pixel
Pixel electronics Connection via solder bump
Global logic and data driver
Monolithic Active Pixel Sensor
Mon olithic Senso
r 50 μm
Pixel
Pixel electronics
Global logic and data driver On-chip interconnect
• HV ∼700 V
• Sensor thickness∼250 µm
• Extra material
• Complex and expensive
• HV ∼70 V (HV-MAPS)
• Thin active zone<20 µm
• Cheap, commercial process
Beyond the Standard Model A2
In Loops At Tree Level
• e.g. SUSY • e.g new heavy boson
Global Efficiency / High Voltage A3
820 830 840 850 860 870 880
Global Threshold / mV
0.82 0.84 0.86 0.88 0.90 0.92 0.94 0.96 0.98 1.00